DUV / EUV light sources are similar in Europe, the United States and Japan.Harmonic Combined reducer CSF-65-160-2UH At present, Cymer is the leader in EUV light source, and both ASML and Nikon are LPP light sources provided by Cymer.

ASML is just an integrator. The most sophisticated part of the lithography machine is the lens / mirror assembly, which accounts for about 75% of the cost. This is the most important part of the lithography Harmonic Combined reducer CSF-65-160-2UHmachine, it is very difficult to be high-end. It needs to be processed to a very high shape accuracy and roughness, and with the improvement of the manufacturing process, the higher the accuracy requirements. In the 100 nm process, the surface accuracy and roughness of RMS 0.5 nm and 0.2 nm are needed. EUVL requires higher requirements, because the wavelength of soft X-ray is very short, and the error of the mirror can not exceed two atoms, which is close to "perfect manufacturing". In this respect, Europe, the UHarmonic Combined reducer CSF-65-160-2UHnited States and Japan are similar, but a small country like the Netherlands can't do it. ASML is just an integrator, and Zeiss of Germany makes lens sets for it. The two countries have been working together for many years, and the relationship between the two countries is also the closest in Europe. As we all know, glass grinding is the strong point of the German people, but you may not think that the processing equipment of Zeiss in Germany is provided by the Americans.